Grinm Advanced Materials Co., Ltd. ("GRIAM"), originally known as Grinm Semiconductor Materials Co., Ltd., and solely sponsored by General Research Institute for Nonferrous Metals ("GRINM") through fund raising, was established in March 1999 and listed on Shanghai Stock Exchange with a registered capital of 838.78 million RMB. The registered address is No. 43 of Bei San Huan Zhong Lu, Haidian District, Beijing.

High purity metal sputtering target material

High purity metal sputtering target material
Widely used in Semiconductor device fabrication and integrated circuit manufacturing, optical film, optical fiber communication device and laser manufacturing, liquid crystal display (LCD), organic light-emitting diode (OLED), magnetic material preparation and magnetic memory device manufacturing, solar cell manufacturing, surface coating and protective film preparation and other all-round electronic information industry fields. The main products include Cu & Cu alloy series, Al & Al alloy series, Ti & Ti Coil, W, WTi, Ta & Ta Coil, Co, Au, Ag, NiPt, NiV, AlSc, CuP and other metal targets. GRIKIN is one of the few industrial platforms in the world with the ability to vertically integrate R&D and production from raw material purification to finished products. The performance indicators of the produced 8-12inch ultra-high purity metal targets have reached international leading standards.


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